
Posted by Ivor Guiney (193.1.100.106) on 17:21:02 10/05/06
I want to coat aluminum oxide onto an aluminum substrate to a
depth of 200-300 microns. This needs to be an even coating and
needs to have very low porosity. Ideally sputtering would be my
choice but that limits me to a few microns.
Does anyone know what process would be best for my problem? Any
help would be appreciated.
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